REMOTE PLASMA ANNEAL
By: APPLIED MATERIALS, INC.
associated with 831 other trademarks
SEMICONDUCTOR WAFER PROCESSING EQUIPMENT, AND COMPONENTS, NAMELY-- EPITAXIAL REACTORS, CHEMICAL VAPOR DEPOSITION REACTORS, PHYSICAL VAPOR DEPOSITION R...

Words that describe this trademark:

wafer processing equipment  chemical vapor deposition  semiconductor wafer processing  equipment components  vapor deposition  processing equipment  components  reactors  epitaxial  deposition 

Serial Number:

75774873

Mark:

REMOTE PLASMA ANNEAL

Status:

Abandoned-Failure to Respond

Status Date:

09-06-2001

Filing Date:

Registration Number:

N/A

Registration Date:

N/A

Goods and Services:

SEMICONDUCTOR WAFER PROCESSING EQUIPMENT, AND COMPONENTS, NAMELY-- EPITAXIAL REACTORS, CHEMICAL VAPOR DEPOSITION REACTORS, PHYSICAL VAPOR DEPOSITION REACTORS, PLASMA ETCHERS, ION IMPLANTERS, CHEMICAL MECHANICAL POLISHERS, SUPPORTING FRAMES THEREFOR, AND PARTS THEREFOR; AND COMPUTER OPERATING PROGRAMS FOR USE THEREWITH

Mark Description:

N/A

Class:

Scientific

Type of Mark:

Trademark

Published for Opposition Date:

N/A

Owner:

Mark Drawing Status:

Typed Drawing

Abandon Date:

07-24-2001

Business Name:

M/S 2061

Correspondent Name:

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