DRAGON
associated with 8 other trademarks
SEMICONDUCTOR WATER PROCESSING EQUIPMENT, NAMELY, THERMAL TREATMENT REACTORS; CHEMICAL VAPOR DEPOSITION REACTORS, ALSO OPERATING WITH ELECTRIC GAS-DIS...

Words that describe this trademark:

chemical vapor deposition  water processing  processing equipment  vapor deposition  thermal treatment  semiconductor  deposition  treatment  equipment  reactors 

Serial Number:

76406820

Mark:

DRAGON

Status:

Cancelled-Section 8

Status Date:

04-24-2010

Filing Date:

Registration Number:

2763630

Registration Date:

09-16-2003

Goods and Services:

SEMICONDUCTOR WATER PROCESSING EQUIPMENT, NAMELY, THERMAL TREATMENT REACTORS; CHEMICAL VAPOR DEPOSITION REACTORS, ALSO OPERATING WITH ELECTRIC GAS-DISCHARGE; ELECTRONICALLY CONTROLLED SEMICONDUCTOR PROCESSING MACHINES FOR THE MANUFACTURE OF SEMICONDUCTORS AND FOR THE DEPOSITION OF THIN FILMS; REPLACEMENT PARTS FOR AFORESAID PRODUCTS

Mark Description:

N/A

Class:

Machines and machine tools

Type of Mark:

Trademark

Published for Opposition Date:

06-24-2003

Mark Drawing Status:

Typed Drawing

Abandon Date:

N/A

Business Name:

BURNS, DOANE, SWECKER & MATHIS, L.L.P.

Correspondent Name:

Recent Trademark filings by this company